NEGATIVE PHOTOSENSITIVE COMPOSITION, AND METHOD FOR PRODUCING PATTERNED CURED FILM
案件概要
発明者
Tomotaka Yamada; Keiichi Ibata; Masaru Takeshita
IPC分類
CPC分類
A negative photosensitive composition having both an etching resistance and good lithography properties, and capable of forming patterns with very small dimensions, and a method for producing a patterned cured film. The negative photosensitive composition includes a silicon-containing polymer including a phenolic hydroxy group, a photoacid generating agent, and a crosslinking agent, and the photoacid generating agent includes a photoacid generating agent) having a sulfonium cation including an iodine atom.
原文（中国語）
A negative photosensitive composition having both an etching resistance and good lithography properties, and capable of forming patterns with very small dimensions, and a method for producing a patterned cured film. The negative photosensitive composition includes a silicon-containing polymer including a phenolic hydroxy group, a photoacid generating agent, and a crosslinking agent, and the photoacid generating agent includes a photoacid generating agent) having a sulfonium cation including an iodine atom.
外部リソース