PHOTORESIST COMPOSITION INCLUDING ORGANOMETALLIC OXIDE CLUSTER HAVING HETEROGENEOUS INORGANIC ELEMENTS AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE BY USING THE PHOTORESIST COMPOSITION
案件概要
発明者
Ahram SUH; Bongjin MOON; Yool KANG; Woojung KIM; Taeyoon PARK; Hanbee KIM; Jaeseung ROH; Sangwon EOM; Kwanheum LEE
IPC分類
CPC分類
A photoresist composition may include an organometallic oxide cluster and a solvent. The organometallic oxide cluster may include a first repeating unit represented by General Formula 1 and a second repeating unit represented by General Formula 2. In General Formulae 1 and 2, R, R, and M may be the same as defined in the detailed description, and * may represent a binding site.
原文（中国語）
A photoresist composition may include an organometallic oxide cluster and a solvent. The organometallic oxide cluster may include a first repeating unit represented by General Formula 1 and a second repeating unit represented by General Formula 2. In General Formulae 1 and 2, R, R, and M may be the same as defined in the detailed description, and * may represent a binding site.
外部リソース