PHOTOSENSITIVE COMPOSITION, AND METHOD FOR PRODUCING PATTERNED SILICON-CONTAINING RESIN FILM
案件概要
出願人
TOKYO OHKA KOGYO CO., LTD.
発明者
Hayato Ouchi; Keiichi Ibata; Saburo Kobayashi
IPC分類
CPC分類
A photosensitive composition capable of forming a patterned silicon-containing resin film with suppressed roughness, and a method for producing a patterned silicon-containing resin film. The photosensitive composition includes a silicon-containing resin and a photoacid generating agent, the silicon-containing resin including a phenolic hydroxy group and a group capable of being cross-linked with an aromatic group having a phenolic hydroxy group under action of an acid, and the photoacid generating agent is a sulfonium salt including a sulfonium cation having a fluorine atom.
原文（中国語）
A photosensitive composition capable of forming a patterned silicon-containing resin film with suppressed roughness, and a method for producing a patterned silicon-containing resin film. The photosensitive composition includes a silicon-containing resin and a photoacid generating agent, the silicon-containing resin including a phenolic hydroxy group and a group capable of being cross-linked with an aromatic group having a phenolic hydroxy group under action of an acid, and the photoacid generating agent is a sulfonium salt including a sulfonium cation having a fluorine atom.
外部リソース