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案件記録

LITHOGRAPHY INFORMATION PROCESSING APPARATUS, LITHOGRAPHY SYSTEM, STORAGE MEDIUM, LITHOGRAPHY INFORMATION PROCESSING METHOD, AND ARTICLE MANUFACTURING METHOD

発明審査中
21請求項 · 4 独立
§ Ⅰ

案件概要

IPC分類

G3F 7/

CPC分類

G3F7/70433

In order to provide a lithography information processing apparatus that can optimize, for example, adjustment of alignment at an outer circumferential part of a substrate, the lithography information processing apparatus includes a display control unit that causes a layout of a shot region of the substrate used in a lithography apparatus to be displayed and causes a position of an effective chip in each of the shot regions to be displayed according to the number of chips included in each of the shot regions.

原文(中国語)

In order to provide a lithography information processing apparatus that can optimize, for example, adjustment of alignment at an outer circumferential part of a substrate, the lithography information processing apparatus includes a display control unit that causes a layout of a shot region of the substrate used in a lithography apparatus to be displayed and causes a position of an effective chip in each of the shot regions to be displayed according to the number of chips included in each of the shot regions.

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