LITHOGRAPHY INFORMATION PROCESSING APPARATUS, LITHOGRAPHY SYSTEM, STORAGE MEDIUM, LITHOGRAPHY INFORMATION PROCESSING METHOD, AND ARTICLE MANUFACTURING METHOD
案件概要
発明者
ATSUSHI KUSAKA
IPC分類
CPC分類
In order to provide a lithography information processing apparatus that can optimize, for example, adjustment of alignment at an outer circumferential part of a substrate, the lithography information processing apparatus includes a display control unit that causes a layout of a shot region of the substrate used in a lithography apparatus to be displayed and causes a position of an effective chip in each of the shot regions to be displayed according to the number of chips included in each of the shot regions.
原文(中国語)
In order to provide a lithography information processing apparatus that can optimize, for example, adjustment of alignment at an outer circumferential part of a substrate, the lithography information processing apparatus includes a display control unit that causes a layout of a shot region of the substrate used in a lithography apparatus to be displayed and causes a position of an effective chip in each of the shot regions to be displayed according to the number of chips included in each of the shot regions.
外部リソース