OPTICAL SYSTEM, IN PARTICULAR FOR MICROLITHOGRAPHY, AND METHOD FOR OPERATING AN OPTICAL SYSTEM
案件概要
発明者
Conrad Wolke; Barbara Moser
IPC分類
CPC分類
An optical system, in particular for microlithography, comprises a laser light source for generating a multiplicity of light pulses, and a control unit configured to control the laser light source in such a way that, for a light pulse sequence generated by the laser light source, the time period between respectively successive light pulses varies across the light pulse sequence. A method comprises operating the optical system.
原文（中国語）
An optical system, in particular for microlithography, comprises a laser light source for generating a multiplicity of light pulses, and a control unit configured to control the laser light source in such a way that, for a light pulse sequence generated by the laser light source, the time period between respectively successive light pulses varies across the light pulse sequence. A method comprises operating the optical system.
外部リソース