PLASMA PROCESSING APPARATUS AND REACTION TUBE WALL PROTECTION MEMBER

原文（中国語）

A plasma processing apparatus includes: a tubular reaction tube; a substrate holder that holds a plurality of substrates stacked in multiple stages and to be inserted into and removed from the reaction tube; a pair of electrodes disposed outside the reaction tube and arranged to face each other across a center of the reaction tube; a radio-frequency power supply that generates plasma in the reaction tube by applying radio-frequency power to both or one of the pair of electrodes; and a pair of reaction tube wall protection members including first and second reaction tube wall protection members. The pair of reaction tube wall protection members cover respective inner wall surfaces of the reaction tube that are opposite to outer wall surfaces of the reaction tube on which the pair of electrodes are installed.