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案件記録

DEVICES INCLUDING TWO-DIMENSIONAL MATERIAL STRUCTURES, AND ELECTRONIC SYSTEMS INCLUDING THE DEVICES

発明審査中
2閲覧数
20請求項 · 3 独立
§ Ⅰ

案件概要

発明者

Roy E. Meade; Sumeet C. Pandey

IPC分類

H1L 21/268H1L 21/2H1L 21/428H1L 21/477H10D 62/10

CPC分類

H1L21/268H1L21/2521H1L21/2568H1L21/259H1L21/2675H1L21/428H1L21/477H10D62/118

A device comprises a 2D material structure including one or more monolayers of a transition metal dichalcogenide substantially free of each of X-interstitial defects, X-vacancy defects, M-interstitial defects, M-vacancy defects, MX-vacancy defects, and XX-vacancy defects. The electronic system comprises at least one device and peripheral circuitry electrically connected to the at least one device. The at least one device includes at least one semiconductor device structure comprising a 2D material structure. The 2D material structure includes one or more monolayers of a transition metal dichalcogenide substantially free of each of X-interstitial defects, X-vacancy defects, M-interstitial defects, M-vacancy defects, MX-vacancy defects, and XX-vacancy defects. Additional electronic system is also described.

原文(中国語)

A device comprises a 2D material structure including one or more monolayers of a transition metal dichalcogenide substantially free of each of X-interstitial defects, X-vacancy defects, M-interstitial defects, M-vacancy defects, MX-vacancy defects, and XX-vacancy defects. The electronic system comprises at least one device and peripheral circuitry electrically connected to the at least one device. The at least one device includes at least one semiconductor device structure comprising a 2D material structure. The 2D material structure includes one or more monolayers of a transition metal dichalcogenide substantially free of each of X-interstitial defects, X-vacancy defects, M-interstitial defects, M-vacancy defects, MX-vacancy defects, and XX-vacancy defects. Additional electronic system is also described.

外部リソース