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案件記録

IN-LINE WAFER POSITIONING SYSTEM USING IR IMAGING

発明審査中
1閲覧数
20請求項 · 3 独立
§ Ⅰ

案件概要

発明者

Yi Kun Kelvin Goh; Han Yan Koh; Kok Keong Lim

IPC分類

H1L 21/67H1L 21/677H1L 21/687

CPC分類

H1L21/67115H1L21/67167H1L21/67196H1L21/67742H1L21/68742

Monitoring system for a semiconductor manufacturing processing tool and methods of monitoring a semiconductor manufacturing process tool are described. The monitoring system has a reflector positioned above a transfer robot in a transfer station of the processing tool. The reflector is configured to direct radiant energy from a processing chamber connected to the transfer station to a camera above the transfer station, the camera configured to measure infrared radiation from the processing chamber.

原文(中国語)

Monitoring system for a semiconductor manufacturing processing tool and methods of monitoring a semiconductor manufacturing process tool are described. The monitoring system has a reflector positioned above a transfer robot in a transfer station of the processing tool. The reflector is configured to direct radiant energy from a processing chamber connected to the transfer station to a camera above the transfer station, the camera configured to measure infrared radiation from the processing chamber.

外部リソース