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案件記録

WAFER CHUCKING SYSTEM

発明審査中
2閲覧数
20請求項 · 3 独立
§ Ⅰ

案件概要

発明者

Sunghyup KIM; Hyojin KOOK; Mijeong SHIN; Sebin CHOI

IPC分類

H1L 21/683

CPC分類

H1L21/6838

A wafer chucking system includes a membrane structure including a first layer having a first coefficient of thermal expansion (CTE) on which a wafer is mountable, and a second layer having a second CTE different from the first CTE, a temperature controller configured to thermally deform the membrane structure by heating or cooling the membrane structure, and an adsorber configured to adsorb the wafer on the membrane structure.

原文(中国語)

A wafer chucking system includes a membrane structure including a first layer having a first coefficient of thermal expansion (CTE) on which a wafer is mountable, and a second layer having a second CTE different from the first CTE, a temperature controller configured to thermally deform the membrane structure by heating or cooling the membrane structure, and an adsorber configured to adsorb the wafer on the membrane structure.

外部リソース