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案件記録

ENHANCED HEMT DEVICE AND PREPARING METHOD THEREOF

発明審査中
15請求項 · 2 独立
§ Ⅰ

案件概要

発明者

Yaqiang LIAO; Quanbin ZHOU; Lihan SHAO

IPC分類

H10D 30/47H1L 23/31H2M 3/H2M 3/155H10D 30/1H10D 62/85

CPC分類

H10D30/475H1L23/3171H1L23/3192H2M3/1H2M3/155H10D30/15H10D62/8503

Disclosed are an enhanced HEMT device and a preparing method thereof. The device includes a substrate, and a primary epitaxial structure and a secondary epitaxial structure that are grown on the substrate. The entire device may be divided into an active region and a gate region in a horizontal direction. The primary epitaxial structure includes a channel layer and a first barrier layer. The secondary epitaxial structure includes a second barrier layer and a p-type cap layer. The first barrier layer is on a part of the channel layer in the active region. The second barrier layer is on a part of the channel layer in the gate region. The second barrier layer is different from the first barrier layer.

原文(中国語)

Disclosed are an enhanced HEMT device and a preparing method thereof. The device includes a substrate, and a primary epitaxial structure and a secondary epitaxial structure that are grown on the substrate. The entire device may be divided into an active region and a gate region in a horizontal direction. The primary epitaxial structure includes a channel layer and a first barrier layer. The secondary epitaxial structure includes a second barrier layer and a p-type cap layer. The first barrier layer is on a part of the channel layer in the active region. The second barrier layer is on a part of the channel layer in the gate region. The second barrier layer is different from the first barrier layer.

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