ENHANCED HEMT DEVICE AND PREPARING METHOD THEREOF
案件概要
発明者
Yaqiang LIAO; Quanbin ZHOU; Lihan SHAO
IPC分類
CPC分類
Disclosed are an enhanced HEMT device and a preparing method thereof. The device includes a substrate, and a primary epitaxial structure and a secondary epitaxial structure that are grown on the substrate. The entire device may be divided into an active region and a gate region in a horizontal direction. The primary epitaxial structure includes a channel layer and a first barrier layer. The secondary epitaxial structure includes a second barrier layer and a p-type cap layer. The first barrier layer is on a part of the channel layer in the active region. The second barrier layer is on a part of the channel layer in the gate region. The second barrier layer is different from the first barrier layer.
原文(中国語)
Disclosed are an enhanced HEMT device and a preparing method thereof. The device includes a substrate, and a primary epitaxial structure and a secondary epitaxial structure that are grown on the substrate. The entire device may be divided into an active region and a gate region in a horizontal direction. The primary epitaxial structure includes a channel layer and a first barrier layer. The secondary epitaxial structure includes a second barrier layer and a p-type cap layer. The first barrier layer is on a part of the channel layer in the active region. The second barrier layer is on a part of the channel layer in the gate region. The second barrier layer is different from the first barrier layer.
外部リソース