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案件記録

SEMICONDUCTOR DEVICE

発明審査中
1閲覧数
14請求項 · 1 独立
§ Ⅰ

案件概要

IPC分類

H10D 30/66H10D 30/1H10D 62/10H10D 62/60

CPC分類

H10D30/662H10D62/102H10D62/124H10D62/60H10D30/291

A semiconductor device includes a drift layer of a first conductivity type, a channel layer of a second conductivity type, a source layer of the first conductivity type, a gate electrode, a source electrode, and a drain electrode. In a case where an impurity concentration of the drift layer is different in the drift layer, an integral value of an electric field applied to the drift layer is set as a withstand voltage value, and an integral value of an electric field in a case where the impurity concentration of the drift layer is constant in the drift layer is set as a reference value, (the withstand voltage−the reference value)/the reference value is equal to or greater than 0 and equal to or less than 0.32.

原文(中国語)

A semiconductor device includes a drift layer of a first conductivity type, a channel layer of a second conductivity type, a source layer of the first conductivity type, a gate electrode, a source electrode, and a drain electrode. In a case where an impurity concentration of the drift layer is different in the drift layer, an integral value of an electric field applied to the drift layer is set as a withstand voltage value, and an integral value of an electric field in a case where the impurity concentration of the drift layer is constant in the drift layer is set as a reference value, (the withstand voltage−the reference value)/the reference value is equal to or greater than 0 and equal to or less than 0.32.

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