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案件記録

SHIFTED STACKED FETS WITH BACKSIDE S/D CONTACTS

発明審査中
20請求項 · 3 独立
§ Ⅰ

案件概要

発明者

Sarah Nahar Chowdhury; Ruilong Xie; Chen Zhang; Shay Reboh

IPC分類

H1L 27/88H1L 23/528H1L 23/532H1L 29/6H1L 29/40H1L 29/417H1L 29/423H1L 29/66H1L 29/775H1L 29/786

CPC分類

H10D84/83H1L23/5286H1L23/5329H10D64/254H10D30/14H10D30/43H10D30/6735H10D30/6757H10D62/121H10D64/1

Semiconductor devices include a first bottom field effect transistor (FET) having a bottom source/drain (S/D) structure. A top FET is above the bottom FET and has a top S/D structure. A backside top contact is in electrical contact with a bottom surface and a side surface of the top S/D structure and extends below the bottom FET. A dielectric liner, disposed along sidewalls of the backside top contact, separates the backside top contact from the bottom S/D structure.

原文(中国語)

Semiconductor devices include a first bottom field effect transistor (FET) having a bottom source/drain (S/D) structure. A top FET is above the bottom FET and has a top S/D structure. A backside top contact is in electrical contact with a bottom surface and a side surface of the top S/D structure and extends below the bottom FET. A dielectric liner, disposed along sidewalls of the backside top contact, separates the backside top contact from the bottom S/D structure.

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