원래 이름 기록: Lam Research Corporation

Examples are disclosed that relate to operating an electrodeposition system comprising an inert anode. In one example system, the electrodeposition system includes a substrate holder and a cathode chamber configured to hold a catholyte. An anode chamber configured to hold an anolyte during the electrodeposition process comprises an inert anode. An intermediate chamber is positioned between the cathode chamber and the anode chamber. The intermediate chamber is separated from the cathode chamber by an ion exchange membrane.

Systems and techniques for obtaining various types of sensor information regarding operational aspects of a semiconductor processing tool are disclosed. Such systems and techniques may involve an instrumented wafer that includes one or more different types of sensors, including, for example, pressure sensors, oxygen (or other gas) sensors, humidity sensors, upward- and/or outward-facing imaging sensors or optical sensors, microphone sensors, and so forth.