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기록

DEPOSITION MASK, METHOD OF MANUFACTURING THE SAME, AND ELECTRONIC DEVICE MANUFACTURED BY USING THE SAME

발명심사 중
5조회수
20청구항 · 3 독립항
§ Ⅰ

개요

IPC 분류

C23C 14/4G2B 27/1H10K 59/12H10K 71/16

CPC 분류

C23C14/42G2B27/172H10K59/1201H10K71/166G2B2027/178

A deposition mask includes a mask frame with a cell opening defined therein and a membrane disposed on the mask frame. The membrane includes a cell region disposed on the cell opening, a plurality of pixel openings is defined in the cell region to be connected to the cell opening, and an interfacial residual stress between the mask frame and the membrane is in a range of about −30 MPa to about 30 MPa.

원문 (중국어)

A deposition mask includes a mask frame with a cell opening defined therein and a membrane disposed on the mask frame. The membrane includes a cell region disposed on the cell opening, a plurality of pixel openings is defined in the cell region to be connected to the cell opening, and an interfacial residual stress between the mask frame and the membrane is in a range of about −30 MPa to about 30 MPa.