METHODS AND APPARATUS FOR EXHAUST BIAS
개요
발명자
Rajmohan Muthaiah; Ruchik Jayeskumar Bhatt; Kalayarasan Seranthian; Shashank Terala; Kranthi Kumar Vaidyula; Sukanya Datta; YoungChol Byun
IPC 분류
CPC 분류
Various embodiments of the present technology may provide a flow control ring disposed between an exhaust plate and a reaction chamber, the flow control ring including a plurality of sections, wherein the plurality of sections consists of a first quarter section, a second quarter section, a third quarter section, and a fourth quarter section, and wherein the second, third, and fourth sections have a first height and the first section has a second height that is greater than the first height.
원문 (중국어)
Various embodiments of the present technology may provide a flow control ring disposed between an exhaust plate and a reaction chamber, the flow control ring including a plurality of sections, wherein the plurality of sections consists of a first quarter section, a second quarter section, a third quarter section, and a fourth quarter section, and wherein the second, third, and fourth sections have a first height and the first section has a second height that is greater than the first height.