MASK PATTERN FORMATION METHOD AND SUBSTRATE PROCESSING METHOD
개요
출원인
Tokyo Electron Limited; NATIONAL UNIVERSITY CORPORATION OKAYAMA UNIVERSITY
발명자
Shin OOWADA; Ryuichi ASAKO; Makoto MURAMATSU; Tsutomu ONO; Takaichi WATANABE
IPC 분류
CPC 분류
A mask pattern formation method includes applying a substance that includes a polymerizable ionic liquid to a substrate, causing a polymerization reaction of the polymerizable ionic liquid for at least a part of the substance that includes a polymerizable ionic liquid to produce a substance that include a polymeric ionic liquid on the substrate, and forming a mask pattern of the substance that includes a polymeric ionic liquid on the substrate by using the substance that includes a polymeric ionic liquid.
원문 (중국어)
A mask pattern formation method includes applying a substance that includes a polymerizable ionic liquid to a substrate, causing a polymerization reaction of the polymerizable ionic liquid for at least a part of the substance that includes a polymerizable ionic liquid to produce a substance that include a polymeric ionic liquid on the substrate, and forming a mask pattern of the substance that includes a polymeric ionic liquid on the substrate by using the substance that includes a polymeric ionic liquid.