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기록

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE

발명심사 중
3조회수
13청구항 · 1 독립항
§ Ⅰ

개요

발명자

Akihiro Kaneko; Akiyoshi Goto

IPC 분류

G3F 7/4G3F 7/39G3F 7/20G3F 7/32

CPC 분류

G3F7/45G3F7/39G3F7/20G3F7/32

An actinic ray-sensitive or radiation-sensitive resin composition containing a resin (A) which provides increased polarity by action of an acid, an onium salt (B) represented by a formula (1) described in the Specification, and a resin (C) satisfying specified conditions, a resist film, a pattern forming method, and a method for producing an electronic device that use the actinic ray-sensitive or radiation-sensitive resin composition.

원문 (중국어)

An actinic ray-sensitive or radiation-sensitive resin composition containing a resin (A) which provides increased polarity by action of an acid, an onium salt (B) represented by a formula (1) described in the Specification, and a resin (C) satisfying specified conditions, a resist film, a pattern forming method, and a method for producing an electronic device that use the actinic ray-sensitive or radiation-sensitive resin composition.