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기록

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER, AND SEMICONDUCTOR DEVICE USING THE SAME

발명심사 중
2조회수
20청구항 · 3 독립항
§ Ⅰ

개요

발명자

Sang Soo KIM; Taek-Jin BAEK; Heekyoung KANG; Jinhee KANG; Jiyu KIM; Mingyum KIM; Chungbeum HONG; Byeongwook PARK; Yushin PARK

IPC 분류

G3F 7/28C8G 73/12G3F 7/37G3F 7/16H1L 23/532

CPC 분류

G3F7/28C8G73/127G3F7/37G3F7/168H1L23/5329

A photosensitive resin composition, a photosensitive resin layer manufactured using the photosensitive resin composition, and a semiconductor device including the photosensitive resin layer are provided. The photosensitive resin composition includes (A) a resin, (B) a photopolymerizable compound, (C) a photopolymerization initiator, and (D) a solvent. The photopolymerizable compound includes a compound represented by Chemical Formula 1.

원문 (중국어)

A photosensitive resin composition, a photosensitive resin layer manufactured using the photosensitive resin composition, and a semiconductor device including the photosensitive resin layer are provided. The photosensitive resin composition includes (A) a resin, (B) a photopolymerizable compound, (C) a photopolymerization initiator, and (D) a solvent. The photopolymerizable compound includes a compound represented by Chemical Formula 1.