CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS
개요
발명자
Masahiro Fukushima; Satoshi Watanabe; Kenji Funatsu; Keiichi Masunaga; Masaaki Kotake; Yuta Matsuzawa
IPC 분류
CPC 분류
A chemically amplified negative resist composition contains (A) a base polymer containing a polymer which contains a repeat unit having formula (A1) and a repeat unit having formula (A2). The polymer is adapted to decrease its solubility in an aqueous alkaline solution under an action of an acid. The polymer may serve as a polymer-bound acid generator.
원문 (중국어)
A chemically amplified negative resist composition contains (A) a base polymer containing a polymer which contains a repeat unit having formula (A1) and a repeat unit having formula (A2). The polymer is adapted to decrease its solubility in an aqueous alkaline solution under an action of an acid. The polymer may serve as a polymer-bound acid generator.