PHOTOSENSITIVE COMPOSITION, METHOD FOR FORMING PATTERNED SILICON-CONTAINING RESIN FILM, AND SILICON-CONTAINING RESIN
개요
발명자
Saburo Kobayashi; Hayato Ouchi; Keiichi Ibata
IPC 분류
CPC 분류
A photosensitive composition capable of forming a fine pattern with high sensitivity and low roughness; a method for producing a patterned silicon-containing resin film using the photosensitive composition; and a silicon-containing resin that can be preferably incorporated into the photosensitive composition. The photosensitive composition includes a silicon-containing resin, a photoacid generating agent, and a cross-linking agent, and the silicon-containing resin has an aromatic group substituted with one or more iodine atoms.
원문 (중국어)
A photosensitive composition capable of forming a fine pattern with high sensitivity and low roughness; a method for producing a patterned silicon-containing resin film using the photosensitive composition; and a silicon-containing resin that can be preferably incorporated into the photosensitive composition. The photosensitive composition includes a silicon-containing resin, a photoacid generating agent, and a cross-linking agent, and the silicon-containing resin has an aromatic group substituted with one or more iodine atoms.