RESIST TOPCOAT COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION
개요
발명자
Ran NAMGUNG; Hyeon PARK; Daeseok SONG; Kyoungjin HA; Minsoo KIM
IPC 분류
CPC 분류
Provided are a resist topcoat composition and a method of forming patterns using the resist topcoat composition, the resist topcoat composition including a polymer including a first structural unit and a second structural unit; and a solvent, wherein the first structural unit is represented by Chemical Formula M-1, and the second structural unit includes a metal element and is derived from a compound having an unsaturated double bond. Details of the Chemical Formulas are as described in the specification.
원문 (중국어)
Provided are a resist topcoat composition and a method of forming patterns using the resist topcoat composition, the resist topcoat composition including a polymer including a first structural unit and a second structural unit; and a solvent, wherein the first structural unit is represented by Chemical Formula M-1, and the second structural unit includes a metal element and is derived from a compound having an unsaturated double bond. Details of the Chemical Formulas are as described in the specification.