BOWL AND SUBSTRATE TREATMENT APPARATUS
개요
발명자
A Rah CHO; Jong Wha KANG; Eun Hyeok CHOI; Byoung Doo CHOI
IPC 분류
CPC 분류
The present disclosure provides a bowl and a substrate treatment apparatus. The bowl includes: a bowl body disposed around a support unit supporting and rotating a substrate, and having an exhaust pipe formed in a lower portion thereof to be connected to an exhaust duct disposed in a lower side thereof; and an outlet guide formed in a lower portion of the exhaust pipe and having an outlet opening formed in an extension direction of the exhaust duct oriented toward an exhaust portion so as to guide gas introduced into the exhaust pipe from the bowl body, to the exhaust portion of the exhaust duct.
원문 (중국어)
The present disclosure provides a bowl and a substrate treatment apparatus. The bowl includes: a bowl body disposed around a support unit supporting and rotating a substrate, and having an exhaust pipe formed in a lower portion thereof to be connected to an exhaust duct disposed in a lower side thereof; and an outlet guide formed in a lower portion of the exhaust pipe and having an outlet opening formed in an extension direction of the exhaust duct oriented toward an exhaust portion so as to guide gas introduced into the exhaust pipe from the bowl body, to the exhaust portion of the exhaust duct.