METAL INTERCONNECTION LINE AND MANUFACTURING METHOD THEREFOR

원문 (중국어)

The present invention provides a metal interconnection line and a method of manufacturing the same. The method includes: providing a wafer on which a metal layer comprising an Al layer is formed; performing an ME process on the Al layer using a chlorine-containing gas, thereby removing a partial thickness of the Al layer and producing AlCl; performing a gradient OE process on the remainder of the Al layer using the chlorine-containing gas and a fluorine-containing gas, thereby removing an undesired part of the remainder of the Al layer and forming an Al interconnection line, wherein in the gradient OE process, a proportion of the fluorine-containing gas is increased stepwise to exchange the AlClfor AlF; and soaking the wafer in an NHF solution to remove the AlF. According to the present invention, Cl− ions remaining on the surface of the Al interconnection line from the etching processes for forming the line can be completely removed, preventing corrosion of the Al interconnection line.