PROCESS GAS MONITORING APPARATUS, VOLATILIZATION VESSEL, SUBSTRATE PROCESSING APPARATUS, AND METHOD
개요
발명자
SunJoo Park; HakJoo Lee; WanGyu Lim; SeungMin Shin; Junli Li
IPC 분류
CPC 분류
This disclosure relates to a process gas monitoring apparatus, a volatilization vessel, a substrate processing apparatus, and a method for monitoring supply of process gas into a process chamber. The process gas comprises a chemical substance thermally decomposable to form a decomposition product, and the method comprises measuring concentration of the decomposition product in the process gas.
원문 (중국어)
This disclosure relates to a process gas monitoring apparatus, a volatilization vessel, a substrate processing apparatus, and a method for monitoring supply of process gas into a process chamber. The process gas comprises a chemical substance thermally decomposable to form a decomposition product, and the method comprises measuring concentration of the decomposition product in the process gas.