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기록

GAS INJECTION SYSTEMS, REACTOR SYSTEMS INCLUDING GAS INJECTION SYSTEMS, AND METHODS FOR SUPPLYING A PROCESS GAS TO A REACTION CHAMBER

발명심사 중
2조회수
20청구항 · 3 독립항
§ Ⅰ

개요

발명자

Chuwei Chen; Wentao Wang; Junwei Su; Alexandros Demos

IPC 분류

H1L 21/67

CPC 분류

H1L21/67069

Gas injection systems, reactor systems including gas injection systems, and methods for supplying a process gas to a reaction chamber are disclosed. The gas injection systems disclosed include gas source assemblies coupled to gas distribution assemblies in which an etchant gas and a precursor gas are combined prior to injection into a reaction chamber.

원문 (중국어)

Gas injection systems, reactor systems including gas injection systems, and methods for supplying a process gas to a reaction chamber are disclosed. The gas injection systems disclosed include gas source assemblies coupled to gas distribution assemblies in which an etchant gas and a precursor gas are combined prior to injection into a reaction chamber.