WAFER INDEXING MECHANISM FOR PROCESS MODULE
개요
발명자
Salam Harb
IPC 분류
CPC 분류
A process module for a process module of a substrate processing system includes a vacuum chamber and a non-vacuum chamber. A substrate support is positioned in the vacuum chamber, is configured to support a substrate incoming into the vacuum chamber, and is coupled to a magnet. A metal component is further positioned to include a motor coil in the non-vacuum chamber. When the motor coil is energized, the motor coil and the magnet interact to generate a magnetic field allowing the substrate support to rotate about a first axis and place the substrate in a desired location. Rotary wafer indexers for process module of substrate processing systems and methods of making substrate indexers are also described.
원문 (중국어)
A process module for a process module of a substrate processing system includes a vacuum chamber and a non-vacuum chamber. A substrate support is positioned in the vacuum chamber, is configured to support a substrate incoming into the vacuum chamber, and is coupled to a magnet. A metal component is further positioned to include a motor coil in the non-vacuum chamber. When the motor coil is energized, the motor coil and the magnet interact to generate a magnetic field allowing the substrate support to rotate about a first axis and place the substrate in a desired location. Rotary wafer indexers for process module of substrate processing systems and methods of making substrate indexers are also described.