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기록

SUBSTRATE PROCESSING APPARATUS

발명심사 중
1조회수
6청구항 · 1 독립항
§ Ⅰ

개요

발명자

Kenji AMAHISA; Shinichi TANIGUCHI; Akihiro IWASAKI

IPC 분류

H1L 21/677B8B 3/4H1L 21/67

CPC 분류

H1L21/67718B8B3/4H1L21/67727H1L21/67057

In a substrate processing apparatus, a carrier that contains a plurality of substrates is transported by a plurality of transport devices on a predetermined transport path from a start point to an end point. In a processing section provided in part of the transport path, a predetermined process is executed on the plurality of substrates contained in the carrier by a liquid processing unit. In the transport path, a posture changer that changes the posture of the carrier between a vertical posture and a horizontal posture is provided. The posture changer changes the posture of the carrier such that the carrier keeps the vertical posture in the processing portion and the carrier is kept having the horizontal posture in the portion except for the processing section.

원문 (중국어)

In a substrate processing apparatus, a carrier that contains a plurality of substrates is transported by a plurality of transport devices on a predetermined transport path from a start point to an end point. In a processing section provided in part of the transport path, a predetermined process is executed on the plurality of substrates contained in the carrier by a liquid processing unit. In the transport path, a posture changer that changes the posture of the carrier between a vertical posture and a horizontal posture is provided. The posture changer changes the posture of the carrier such that the carrier keeps the vertical posture in the processing portion and the carrier is kept having the horizontal posture in the portion except for the processing section.