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기록

REAL-TIME COMPUTER VISION END-POINT DETECTION PIPELINE

발명심사 중
2조회수
20청구항 · 3 독립항
§ Ⅰ

개요

발명자

Anthony J. Vasquez; Kyle A. Drake; Chunhua Song

IPC 분류

H1L 21/66H1L 21/67

CPC 분류

H1L22/26H1L21/67253

A semiconductor etching process end-point detection system includes a sensor configured to measure in real-time electrical properties associated with a semiconductor etching process and to generate raw sensor data, and a computing device configured to receive the raw sensor data. The computing device includes spectrum analyzer circuitry and a memory configured to execute instructions of the spectrum analyzer circuitry via at least one processor. The instructions include obtaining, via the sensor, the raw sensor data; receiving, at the computing device, the raw sensor data; preprocessing the raw sensor data to normalize the raw sensor data to a standard range or distribution; selecting at least one best scoring signal of the normalized sensor data; converting the at least one best scoring signal to a pixel space; and performing an end-point prediction algorithm on the pixel space to predict the end-point of the semiconductor etching process.

원문 (중국어)

A semiconductor etching process end-point detection system includes a sensor configured to measure in real-time electrical properties associated with a semiconductor etching process and to generate raw sensor data, and a computing device configured to receive the raw sensor data. The computing device includes spectrum analyzer circuitry and a memory configured to execute instructions of the spectrum analyzer circuitry via at least one processor. The instructions include obtaining, via the sensor, the raw sensor data; receiving, at the computing device, the raw sensor data; preprocessing the raw sensor data to normalize the raw sensor data to a standard range or distribution; selecting at least one best scoring signal of the normalized sensor data; converting the at least one best scoring signal to a pixel space; and performing an end-point prediction algorithm on the pixel space to predict the end-point of the semiconductor etching process.