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기록

MULTIGATE SEMICONDUCTOR DEVICES WITH VARIED THRESHOLD VOLTAGE CHARACTERISTICS

발명심사 중
1조회수
20청구항 · 3 독립항
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개요

발명자

Akira Ito; Sim Loo

IPC 분류

H1L 29/78H1L 29/6H1L 29/8

CPC 분류

H10D30/6215H10D30/6211H10D30/65H10D62/116H10D62/155H10D62/159

An example multigate semiconductor device with varied threshold voltages includes a channel, a source disposed on the channel, a drain disposed on the channel, a first gate disposed on the channel between the source and the drain, and a second gate disposed on the channel between the first gate and the drain. The first gate includes a first metal and the second gate includes a second metal, the second metal being different from the first metal.

원문 (중국어)

An example multigate semiconductor device with varied threshold voltages includes a channel, a source disposed on the channel, a drain disposed on the channel, a first gate disposed on the channel between the source and the drain, and a second gate disposed on the channel between the first gate and the drain. The first gate includes a first metal and the second gate includes a second metal, the second metal being different from the first metal.