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기록

SEMICONDUCTOR DEVICE WITH BACKSIDE SUBSTRATE CUT UNDER THE STI STRUCTURE

발명심사 중
1조회수
20청구항 · 3 독립항
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개요

발명자

Xiaoming Yang; Reinaldo Vega; Ruilong Xie

IPC 분류

H1L 29/10H1L 23/48H1L 23/528H1L 23/66H1L 29/6H1L 29/423H1L 29/66H1L 29/775H1L 29/786H1L 29/861

CPC 분류

H10D62/371H1L23/481H1L23/5286H10D62/116H1L23/66H10D8/H10D8/1H10D30/14H10D30/43H10D30/6735H10D30/6757H10D62/121

A semiconductor device includes a logic device including a first portion of a first substrate extending vertically below a first source/drain region, a second portion of the first substrate extending vertically below a second source/drain region, a first shallow trench isolation (STI) extending vertically and isolating the first portion of the first substrate and the second portion of the first substrate, a backside power delivery network (BSPDN) below the logic device, a first dielectric layer extending vertically through the horizontal portion of the first substrate and connected to the first STI and the BSPDN, and an oxide trench wall over sidewalls of a backside contact.

원문 (중국어)

A semiconductor device includes a logic device including a first portion of a first substrate extending vertically below a first source/drain region, a second portion of the first substrate extending vertically below a second source/drain region, a first shallow trench isolation (STI) extending vertically and isolating the first portion of the first substrate and the second portion of the first substrate, a backside power delivery network (BSPDN) below the logic device, a first dielectric layer extending vertically through the horizontal portion of the first substrate and connected to the first STI and the BSPDN, and an oxide trench wall over sidewalls of a backside contact.