SEMICONDUCTOR DEVICE WITH BACKSIDE SUBSTRATE CUT UNDER THE STI STRUCTURE
개요
출원인
INTERNATIONAL BUSINESS MACHINES CORPORATION
발명자
Xiaoming Yang; Reinaldo Vega; Ruilong Xie
IPC 분류
CPC 분류
A semiconductor device includes a logic device including a first portion of a first substrate extending vertically below a first source/drain region, a second portion of the first substrate extending vertically below a second source/drain region, a first shallow trench isolation (STI) extending vertically and isolating the first portion of the first substrate and the second portion of the first substrate, a backside power delivery network (BSPDN) below the logic device, a first dielectric layer extending vertically through the horizontal portion of the first substrate and connected to the first STI and the BSPDN, and an oxide trench wall over sidewalls of a backside contact.
원문 (중국어)
A semiconductor device includes a logic device including a first portion of a first substrate extending vertically below a first source/drain region, a second portion of the first substrate extending vertically below a second source/drain region, a first shallow trench isolation (STI) extending vertically and isolating the first portion of the first substrate and the second portion of the first substrate, a backside power delivery network (BSPDN) below the logic device, a first dielectric layer extending vertically through the horizontal portion of the first substrate and connected to the first STI and the BSPDN, and an oxide trench wall over sidewalls of a backside contact.