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기록

METHOD OF PRODUCING A SEMICONDUCTOR SUBSTRATE WITH MAGNETIC FLUX CONCENTRATORS, AND A MAGNETIC SENSOR DEVICE

발명심사 중
12조회수
15청구항 · 2 독립항
§ Ⅰ

개요

발명자

Jonathan OP DE BEECK; Appo VAN DER WIEL

IPC 분류

H10N 52/1G1R 33/G1R 33/7H10N 52/80

CPC 분류

H10N52/1G1R33/11G1R33/52G1R33/72H10N52/80

A method is for producing a semiconductor wafer having a front side having at least one magnetic sensor element, and a back side, and an interconnection stack having at least one contact area; the method includes the steps of: m) mounting a carrier wafer to the front side; b) thinning the back side; c) providing at least one magnetic concentrator to the front side; d) providing at least one magnetic concentrator to the back side. A magnetic sensor device includes a semiconductor substrate with a magnetic sensor element, a front IMC, and a back IMC, located on opposite sides of the semiconductor substrate.

원문 (중국어)

A method is for producing a semiconductor wafer having a front side having at least one magnetic sensor element, and a back side, and an interconnection stack having at least one contact area; the method includes the steps of: m) mounting a carrier wafer to the front side; b) thinning the back side; c) providing at least one magnetic concentrator to the front side; d) providing at least one magnetic concentrator to the back side. A magnetic sensor device includes a semiconductor substrate with a magnetic sensor element, a front IMC, and a back IMC, located on opposite sides of the semiconductor substrate.