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기록

Transistor structure, radio frequency front-end device and electronic equipment

기타 / 미제공알 수 없음

데이터 출처: EPO OPS

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92727749패밀리
§ Ⅰ

개요

출원인

HUAWEI TECH CO LTD

출원 번호

CN202310316128

발명자

LI LIMING

출원일

Mar 16, 2023

공개일

Sep 20, 2024

특허 패밀리 ID

92727749

IPC 분류

H01L21/762H01L27/088H01L29/10

CPC 분류

H10W10/014H10W10/17

The invention provides a transistor structure, a radio frequency front-end device and electronic equipment. The transistor structure comprises a substrate, an active layer located on the substrate, a gate layer located on the side, away from the substrate, of the active layer, and a gate dielectric layer located between the active layer and the gate layer. The transistor structure further comprises a plurality of isolation grooves, and each isolation groove penetrates through the active layer in the thickness direction. The active layer comprises at least one first channel, each first channel is located between two adjacent isolation grooves, each first channel comprises a first surface, a first side surface and a second side surface, and the pattern of the gate layer covers the first surface, the first side surface and the second side surface of each first channel. In the embodiment of the invention, the pattern of the gate layer can surround the first channel from three sides, and when the transistor structure is turned on, the first channel in the active layer is completely exhausted, so that the defects of floating body effect, short channel effect, source-drain parasitic capacitance and the like of the transistor structure are prevented, and the performance of the transistor structure is improved.

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