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기록

Semiconductor device, manufacturing method thereof and electronic equipment

기타 / 미제공알 수 없음

데이터 출처: EPO OPS

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92777746패밀리
§ Ⅰ

개요

출원인

HUAWEI TECH CO LTD; UNIV FUDAN

출원 번호

CN202310320014

발명자

JIANG ANQUAN; SUN JIE; LI YIMING; LUO SHIJIANG; ZHAO JUNFENG; ZHANG XIANG; NIU XINXIANG

출원일

Mar 23, 2023

공개일

Sep 24, 2024

특허 패밀리 ID

92777746

IPC 분류

H01L21/329H01L21/336H01L29/78H01L29/861

The invention provides a semiconductor device, a manufacturing method thereof and electronic equipment, the semiconductor device comprises a ferroelectric structure and a plurality of electrodes, the included angle between the polarization direction of an electric domain in a first protruding part in the ferroelectric structure and the polarization direction of an electric domain in a body is [0 degree, 90 degrees], the included angle between the polarization direction of the electric domain in the second protruding part in the ferroelectric structure and the polarization direction of the electric domain in the body is (90 degrees, 270 degrees), a PN junction is formed by a first connection position between the first protruding part and the body and a second connection position between the second protruding part and the body, and the plurality of electrodes are in contact with the first connection position and the second connection position respectively. Therefore, the PN junction can be made of ferroelectric materials, compared with a traditional PN junction, the manufacturing process is simpler, a doping process does not need to be executed, the temperature of the manufacturing process is lower, and the manufacturing cost is lower.

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