Semiconductor device, manufacturing method thereof and electronic equipment
데이터 출처: EPO OPS
현재 전문을 불러올 수 없습니다. 조회된 기본 정보는 계속 확인할 수 있습니다.
개요
출원 번호
CN202310320014
발명자
JIANG ANQUAN; SUN JIE; LI YIMING; LUO SHIJIANG; ZHAO JUNFENG; ZHANG XIANG; NIU XINXIANG
출원일
Mar 23, 2023
공개일
Sep 24, 2024
특허 패밀리 ID
92777746
IPC 분류
The invention provides a semiconductor device, a manufacturing method thereof and electronic equipment, the semiconductor device comprises a ferroelectric structure and a plurality of electrodes, the included angle between the polarization direction of an electric domain in a first protruding part in the ferroelectric structure and the polarization direction of an electric domain in a body is [0 degree, 90 degrees], the included angle between the polarization direction of the electric domain in the second protruding part in the ferroelectric structure and the polarization direction of the electric domain in the body is (90 degrees, 270 degrees), a PN junction is formed by a first connection position between the first protruding part and the body and a second connection position between the second protruding part and the body, and the plurality of electrodes are in contact with the first connection position and the second connection position respectively. Therefore, the PN junction can be made of ferroelectric materials, compared with a traditional PN junction, the manufacturing process is simpler, a doping process does not need to be executed, the temperature of the manufacturing process is lower, and the manufacturing cost is lower.
EPO 조사 자료
항목을 선택하면 해당 공개문헌의 공식 자료를 조회합니다.
위 항목을 선택하여 자료를 확인하세요.