Mask plate
데이터 출처: EPO OPS
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개요
출원 번호
CN202322647300U
발명자
BI NA; WANG WEI; LIU HUAMENG
출원일
Sep 27, 2023
공개일
Jun 11, 2024
특허 패밀리 ID
91342809
IPC 분류
The utility model provides a mask plate. The mask plate comprises a substrate, a first evaporation part and a second evaporation part, wherein the first evaporation part and the second evaporation part are arranged on the substrate and are arranged in a spaced mode in the first direction. A plurality of first hollowed-out holes are formed in the first evaporation part, and a plurality of second hollowed-out holes are formed in the second evaporation part. The shape of the first hollow-out hole is different from that of the second hollow-out hole, and/or the distribution density of the first hollow-out hole is different from that of the second hollow-out hole. Mu1/E1 and mu2/E2 are in the same magnitude, mu1 is the Poisson's ratio of the first evaporation part, mu2 is the Poisson's ratio of the second evaporation part, E1 is the elastic modulus of the first evaporation part in the first direction, and E2 is the elastic modulus of the second evaporation part in the first direction. The evaporation efficiency and the evaporation effect can be improved.
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