검색으로 돌아가기
기록

Mask plate

기타 / 미제공알 수 없음

데이터 출처: EPO OPS

현재 전문을 불러올 수 없습니다. 조회된 기본 정보는 계속 확인할 수 있습니다.

91342809패밀리
§ Ⅰ

개요

출원인

BOE TECHNOLOGY GROUP CO LTD

출원 번호

CN202322647300U

발명자

BI NA; WANG WEI; LIU HUAMENG

출원일

Sep 27, 2023

공개일

Jun 11, 2024

특허 패밀리 ID

91342809

IPC 분류

C23C14/04C23C14/24

The utility model provides a mask plate. The mask plate comprises a substrate, a first evaporation part and a second evaporation part, wherein the first evaporation part and the second evaporation part are arranged on the substrate and are arranged in a spaced mode in the first direction. A plurality of first hollowed-out holes are formed in the first evaporation part, and a plurality of second hollowed-out holes are formed in the second evaporation part. The shape of the first hollow-out hole is different from that of the second hollow-out hole, and/or the distribution density of the first hollow-out hole is different from that of the second hollow-out hole. Mu1/E1 and mu2/E2 are in the same magnitude, mu1 is the Poisson's ratio of the first evaporation part, mu2 is the Poisson's ratio of the second evaporation part, E1 is the elastic modulus of the first evaporation part in the first direction, and E2 is the elastic modulus of the second evaporation part in the first direction. The evaporation efficiency and the evaporation effect can be improved.

EPO 조사 자료

항목을 선택하면 해당 공개문헌의 공식 자료를 조회합니다.

위 항목을 선택하여 자료를 확인하세요.

특허 조사 도구