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案件記録

ULTRAVIOLET LIGHT CLEANING SYSTEMS AND METHODS OF USE

発明審査中
20請求項 · 3 独立
§ Ⅰ

案件概要

IPC分類

A61L 2/10A61L 2/24

CPC分類

A61L2/10A61L2/24A61L2202/11A61L2202/14A61L2202/15

The present disclosure provides a cleaning system that includes an ultraviolet (UV) light source configured to emit a UV light in a predetermined wavelength range and a target having a predetermined transparency to the predetermined wavelength range. The cleaning system may further include a contact element removably coupled to the target. The UV light source cleans the target, which is configured to cause motion of the contact element in response to force being applied to the target. The cleaning system can further include one or more reflectors or absorbers coupled to the target or the UV light source, or positioned relative to the target or the UV light source, as to control the emission of UV light.

原文(中国語)

The present disclosure provides a cleaning system that includes an ultraviolet (UV) light source configured to emit a UV light in a predetermined wavelength range and a target having a predetermined transparency to the predetermined wavelength range. The cleaning system may further include a contact element removably coupled to the target. The UV light source cleans the target, which is configured to cause motion of the contact element in response to force being applied to the target. The cleaning system can further include one or more reflectors or absorbers coupled to the target or the UV light source, or positioned relative to the target or the UV light source, as to control the emission of UV light.

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