ENHANCED SILICON GRIND USING CHEMICAL ADDITIVES IN FLUID DURING GRINDING PROCESS

原文（中文）

A method and apparatus for grinding a surface of a substrate is presented. The method includes positioning a substrate proximate a grinding surface using a carrier head, providing a pressure on the substrate to press an unpolished surface of the substrate to the grinding surface, flowing a grinding fluid onto the unpolished surface, the grinding fluid comprising a pH adjuster, viscosity additives, a surfactant, or combinations thereof, and grinding the unpolished surface using the grinding surface to create a polished surface on the substrate.