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기록

COMPOSITION AND POLYMER

발명심사 중
9청구항 · 2 독립항
§ Ⅰ

개요

발명자

Ryutaro Sugawara; Takuya Uehara; Saburo Kobayashi

IPC 분류

C8G 81/2

CPC 분류

C8G81/27

A composition for selective modification of a base material having a surface containing two or more regions that are different in material from each other, the composition including a polymer and a solvent. The polymer has a block (A1) and a block (A2; the block (A1) has a constituent unit derived from at least one of styrene, a styrene derivative, and an (α-substituted) acrylate; the block (A2) having two or more groups represented by the following formula (1) in which X represents a single bond or an oxygen atom, and Rrepresents an alkyl group, and the group represented by the formula (1) is bonded to a carbon atom.

원문 (중국어)

A composition for selective modification of a base material having a surface containing two or more regions that are different in material from each other, the composition including a polymer and a solvent. The polymer has a block (A1) and a block (A2; the block (A1) has a constituent unit derived from at least one of styrene, a styrene derivative, and an (α-substituted) acrylate; the block (A2) having two or more groups represented by the following formula (1) in which X represents a single bond or an oxygen atom, and Rrepresents an alkyl group, and the group represented by the formula (1) is bonded to a carbon atom.