ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMING PROCESS
개요
발명자
Masahiro Fukushima
IPC 분류
CPC 분류
The onium salt has the formula (1). The chemically amplified resist composition comprising the onium salt has a high solvent solubility and a high sensitivity and being improved in lithography properties such as LWR, CDU, MEF, EL, and DOF with high contrast when processed by photolithography using high-energy radiation such as KrF or ArF excimer laser, EB, or EUV.
원문 (중국어)
The onium salt has the formula (1). The chemically amplified resist composition comprising the onium salt has a high solvent solubility and a high sensitivity and being improved in lithography properties such as LWR, CDU, MEF, EL, and DOF with high contrast when processed by photolithography using high-energy radiation such as KrF or ArF excimer laser, EB, or EUV.