CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS
案件概要
発明者
Masahiro Fukushima; Satoshi Watanabe; Kenji Funatsu; Keiichi Masunaga; Masaaki Kotake; Yuta Matsuzawa
IPC分類
CPC分類
A chemically amplified negative resist composition contains (A) a base polymer containing a polymer which contains a repeat unit having formula (A1) and a repeat unit having formula (A2). The polymer is adapted to decrease its solubility in an aqueous alkaline solution under an action of an acid. The polymer may serve as a polymer-bound acid generator.
原文（中国語）
A chemically amplified negative resist composition contains (A) a base polymer containing a polymer which contains a repeat unit having formula (A1) and a repeat unit having formula (A2). The polymer is adapted to decrease its solubility in an aqueous alkaline solution under an action of an acid. The polymer may serve as a polymer-bound acid generator.
外部リソース