PHOTORESIST COMPOSITION INCLUDING ORGANOMETALLIC OXIDE CLUSTER HAVING HETEROGENEOUS INORGANIC ELEMENTS AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE BY USING THE PHOTORESIST COMPOSITION
卷宗概要
申请人
Samsung Electronics Co., Ltd.
发明人
Ahram SUH; Bongjin MOON; Yool KANG; Woojung KIM; Taeyoon PARK; Hanbee KIM; Jaeseung ROH; Sangwon EOM; Kwanheum LEE
IPC 分类
CPC 分类
A photoresist composition may include an organometallic oxide cluster and a solvent. The organometallic oxide cluster may include a first repeating unit represented by General Formula 1 and a second repeating unit represented by General Formula 2. In General Formulae 1 and 2, R, R, and M may be the same as defined in the detailed description, and * may represent a binding site.
原文（中文）
A photoresist composition may include an organometallic oxide cluster and a solvent. The organometallic oxide cluster may include a first repeating unit represented by General Formula 1 and a second repeating unit represented by General Formula 2. In General Formulae 1 and 2, R, R, and M may be the same as defined in the detailed description, and * may represent a binding site.