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기록

STRUCTURES WITH ENHANCED THERMAL HEAT SPREADING AND REMOVAL

발명심사 중
20청구항 · 2 독립항
§ Ⅰ

개요

발명자

John Knickerbocker; John W Golz; Keiji Matsumoto; Mukta Ghate Farooq

IPC 분류

H1L 23/528H1L 23/367H1L 23/522H1L 25/65

CPC 분류

H1L23/5283H1L23/3675H1L23/5226H1L23/5286H1L25/657H1L2225/6541

Structures including semiconductor chips (including chiplets and stacked chips/chiplets) are provided in which thermal heat removal is enhanced. The enhanced thermal heat removal is provided by utilizing interlayer dielectric (ILD) materials in at least one of the frontside back-end-of-the-line (BEOL) structure or the backside BEOL structure that have a high thermal conductivity.

원문 (중국어)

Structures including semiconductor chips (including chiplets and stacked chips/chiplets) are provided in which thermal heat removal is enhanced. The enhanced thermal heat removal is provided by utilizing interlayer dielectric (ILD) materials in at least one of the frontside back-end-of-the-line (BEOL) structure or the backside BEOL structure that have a high thermal conductivity.