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기록

CONTAMINATION FREE COPPER INTERCONNECT ON ALUMINUM PAD

발명심사 중
20청구항 · 3 독립항
§ Ⅰ

개요

발명자

Shafaat AHMED; Darren DENARDIS

IPC 분류

H1L 23/

CPC 분류

H1L24/5H1L24/8H1L24/3H1L2224/355H1L2224/5085H1L2224/5124H1L2224/5186H1L2224/5647H1L2224/8225

Embodiments disclosed herein include an apparatus that comprises a pad, and the pad comprises aluminum. In an embodiment, a liner is on a sidewall of the pad, and the liner extends past a surface of the pad. In an embodiment, a first layer is over the pad, and the first layer comprises copper. In an embodiment, a second layer is over the first layer, and the second layer is a dielectric material. In an embodiment, a via that passes through the second layer and contacts the first layer.

원문 (중국어)

Embodiments disclosed herein include an apparatus that comprises a pad, and the pad comprises aluminum. In an embodiment, a liner is on a sidewall of the pad, and the liner extends past a surface of the pad. In an embodiment, a first layer is over the pad, and the first layer comprises copper. In an embodiment, a second layer is over the first layer, and the second layer is a dielectric material. In an embodiment, a via that passes through the second layer and contacts the first layer.