원래 이름 기록: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.

A resin composition contains a polyphenylene ether compound (A), a reactive compound (B) having an unsaturated double bond in a molecule, and at least one additive (C) selected from the group consisting of a heavy metal deactivator (C1) having at least one of an amino group and a triazole structure and a phenolic hydroxyl group in a molecule, a phosphite-based antioxidant (C2) having a tertiary butyl group and a phosphite structure in a molecule, and a hindered phenol-based antioxidant (C3) having a tertiary butyl group and a phenolic hydroxyl group in a molecule.

A resin composition contains a preliminary reaction product (A) obtained by previously reacting a mixture containing a polyphenylene ether compound (a1) having at least one of a hydroxyl group and a carboxyl group in a molecule and a carbodiimide compound (a2), and a reactive compound (B) having an unsaturated double bond in a molecule.

This information processing device is configured to: acquire input fault data indicating fault content; determine, in order from an upper level, a corresponding focus item to which the input fault data corresponds, said item selected from a plurality of focus items which were classified for each of a plurality of levels and which are for narrowing down the countermeasures to or the causes of the fault content; and display, on a display device, the corresponding focus item determined for each of the plurality of levels.

Disclosed is a dicing system including a protection layer forming apparatus, a patterning apparatus, a plasma treatment apparatus, a measuring apparatus that obtains at least of first processing data relating to a protection layer, second processing data relating to a mask, and third processing data relating to element chips, and a control unit that operates at least one of the protection layer forming apparatus, the patterning apparatus, and the plasma treatment apparatus on a recipe that is defined for each of the apparatuses. The control unit determines, based on at least one of the first processing data, whether or not to modify the recipe, the second processing data, and the third processing data, modifies the at least one of the recipes if the recipe needs to be modified, and operates at least one of the protection layer forming apparatus, the patterning apparatus, and the plasma treatment apparatus based on the modified recipe.