一种二维或双层光栅结构及其制备方法
本申请涉及一种二维或双层光栅结构及其制备方法,属于微纳加工技术领域。该结构包括在衬底上依次堆叠的底层光刻胶和顶层光刻胶,底层光刻胶仅对第一波长紫外光敏感,顶层光刻胶仅对第二波长紫外光敏感。通过分别使用两种不同波长的紫外光源对两层光刻胶进行选择性曝光,实现各自图案的独立控制,经显影后形成双层或二维光栅结构。该方法避免了传统工艺中多次涂胶、对位不准的问题,提高了结构精度与工艺效率,适用于光子晶体、光栅耦合器、偏振分束器等光子器件的制备。
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