METHOD AND APPARATUS FOR ETCHING A SURFACE
案件概要
発明者
Matthew Surman; Mikhail Krishtab; Elisa K. Atosuo; Tao Xu; Elina Färm; Charles Dezelah; Patricio Eduardo Romero
IPC分類
CPC分類
Methods and related systems for etching. Embodiments of the present disclosure comprise etching an etchable layer by executing a cyclical etching process comprising a plurality of etching cycles. Ones from the plurality of etching cycles comprise a volatilization reactant pulse that comprises exposing a substrate to a volatilization reactant.
原文（中国語）
Methods and related systems for etching. Embodiments of the present disclosure comprise etching an etchable layer by executing a cyclical etching process comprising a plurality of etching cycles. Ones from the plurality of etching cycles comprise a volatilization reactant pulse that comprises exposing a substrate to a volatilization reactant.
外部リソース