GAS INJECTION SYSTEMS, REACTOR SYSTEMS INCLUDING GAS INJECTION SYSTEMS, AND METHODS FOR SUPPLYING A PROCESS GAS TO A REACTION CHAMBER
案件概要
発明者
Chuwei Chen; Wentao Wang; Junwei Su; Alexandros Demos
IPC分類
CPC分類
Gas injection systems, reactor systems including gas injection systems, and methods for supplying a process gas to a reaction chamber are disclosed. The gas injection systems disclosed include gas source assemblies coupled to gas distribution assemblies in which an etchant gas and a precursor gas are combined prior to injection into a reaction chamber.
原文（中国語）
Gas injection systems, reactor systems including gas injection systems, and methods for supplying a process gas to a reaction chamber are disclosed. The gas injection systems disclosed include gas source assemblies coupled to gas distribution assemblies in which an etchant gas and a precursor gas are combined prior to injection into a reaction chamber.
外部リソース