원래 이름 기록: Axcelis Technologies, Inc.

An ion source has an arc chamber and multiple electrode pairs that define a respective plasma column axis within the arc chamber. A source magnet surrounds the arc chamber and defines pole pairs, each respectively associated with the electrode pairs to confine a plasma to the respective plasma column axis. The source magnet can be an electromagnet or a permanent magnet. The electromagnet has coils and a magnetic core to define the pole pairs and confine the plasma to the respective plasma column based on a coil current supplied to the coils. The magnetic core can have movable core members to magnetically couple each of the plurality of pole pairs. The permanent magnet has a magnetic core and movable core members to selectively magnetically couple the permanent magnet to each of the plurality of pole pairs.

A system and method for clamping a workpiece positions a workpiece on a clamping surface of an electrostatic clamp (ESC). The clamping surface is electrically grounded or electrically floated based on conditions of the workpiece and the ESC, such as a resistivity of the workpiece, where the clamping surface is electrically floated when the resistivity of the workpiece is high. A clamping voltage is applied to the ESC to clamp the workpiece to the clamping surface for semiconductor processing. The clamping surface is electrically coupled to an electrical ground for releasing the workpiece from the clamping surface. A release status of the workpiece is determined, to be in a clamped or released state. When the release status is clamped, a bias potential is applied to the clamping surface by a switch to promote de-clamping. When the release status is released, the workpiece is removed from the clamping surface.