COACERVATE CLEANSING COMPOSITION WITH ACNE TREATMENT ACTIVE
개요
발명자
Changlong CHEN; Siliu TAN; Christopher PANG; Sho WATANABE; Mariko HASEBE
IPC 분류
CPC 분류
The disclosure related to compositions comprising (a) at least one amphoteric surfactant, (b) at least one glycolipid, (c) at least one cationic polymer from about 0.05% to about 2%, (d) at least one acne treatment active, and (e) at least one cosmetically acceptable solvent wherein the cleansing system is essentially free of phenoxyethanol, and wherein the pH of the composition is between about 4 and about 8, and wherein the weight ratio of a to b is about 0.4 to about 4, and wherein the total concentration of a and b combined is about 10% to about 20% of the total weight of the composition. The compositions can be used as rinse-off compositions for cleansing skin and depositing acne treatment actives.
원문 (중국어)
The disclosure related to compositions comprising (a) at least one amphoteric surfactant, (b) at least one glycolipid, (c) at least one cationic polymer from about 0.05% to about 2%, (d) at least one acne treatment active, and (e) at least one cosmetically acceptable solvent wherein the cleansing system is essentially free of phenoxyethanol, and wherein the pH of the composition is between about 4 and about 8, and wherein the weight ratio of a to b is about 0.4 to about 4, and wherein the total concentration of a and b combined is about 10% to about 20% of the total weight of the composition. The compositions can be used as rinse-off compositions for cleansing skin and depositing acne treatment actives.