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기록

Metallic Substrate Laser Treatment

발명심사 중
20청구항 · 3 독립항
§ Ⅰ

개요

발명자

Henry H. Thayer; Elaheh Fattahi Taghaddos; Hamidreza Mohseni; Seung-Yub Lee; David U. Furrer

IPC 분류

F1D 11/C22F 1/C22F 1/10C23C 26/F16J 9/14

CPC 분류

F1D11/5C22F1/6C22F1/10C23C26/F5D2230/40F5D2240/58F5D2260/941F16J9/14

A method for laser treating a substrate includes: deforming the substrate to place a portion of a first surface of the substrate in tensile stress; and while holding the substrate deformed, laser treating the portion. After the laser treating but before release of the deformation, the first surface may remain in tensile stress. Release of the deformation then at least partially cancels the tensile stress.

원문 (중국어)

A method for laser treating a substrate includes: deforming the substrate to place a portion of a first surface of the substrate in tensile stress; and while holding the substrate deformed, laser treating the portion. After the laser treating but before release of the deformation, the first surface may remain in tensile stress. Release of the deformation then at least partially cancels the tensile stress.