Dossier

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS

InventionPending

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Dossier Overview

Applicant

Shin-Etsu Chemical Co., Ltd.

Inventor

FUKUSHIMA, Masahiro; WATANABE, Satoshi; FUNATSU, Kenji; MASUNAGA, Keiichi; KOTAKE, Masaaki; MATSUZAWA, Yuta

Filing Date

Jun 24, 2025

Publication Date

Jan 6, 2026

IPC Classification

G03FG03F

CPC Classification

G03FG03FG03FG03F

External Resources